Browsing by Subject "gate dielectric"
Now showing items 1-2 of 2
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(Texas A&M University, 2007-04-25)A novel high-k gate dielectric material, i.e., hafnium-doped tantalum oxide (Hf-doped TaOx), has been studied for the application of the future generation metal-oxidesemiconductor field effect transistor (MOSFET). The ...
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(Texas A&M University, 2005-02-17)A new high-k dielectric material, i.e., zirconium-doped tantalum oxide (Zr-doped TaOx), in the form of a sputter-deposited thin film with a thickness range of 5-100 nm, has been studied. Important applications of this new ...